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Temperature dependence of the growth rate of silicon prepared through chemical vapor deposition from silane
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10.1063/1.93436
/content/aip/journal/apl/41/2/10.1063/1.93436
http://aip.metastore.ingenta.com/content/aip/journal/apl/41/2/10.1063/1.93436
/content/aip/journal/apl/41/2/10.1063/1.93436
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/content/aip/journal/apl/41/2/10.1063/1.93436
1982-07-15
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Temperature dependence of the growth rate of silicon prepared through chemical vapor deposition from silane
http://aip.metastore.ingenta.com/content/aip/journal/apl/41/2/10.1063/1.93436
10.1063/1.93436
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