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Multiply scanned electron beam annealing of ion implanted indium phosphide
1.S. S. Gill, P. J. Topham, B. J. Sealy, and K. G. Stephens, J. Phys. D 14, 2333 (1981).
2.D. E. Davies, J. P. Lorenzo, T. G. Ryan, and J. J. Fitzgerald, Appl. Phys. Lett. 35, 631 (1979).
3.D. E. Davies, W. D. Potter, and J. P. Lorenzo, J. Electrochem. Soc. 125, 1845 (1978).
4.S. S. Gill, B. J. Sealy, P. J. Topham, N. J. Barrett, and K. G. Stephens, Electron. Lett. 17, 623 (1981).
5.S. S. Gill and S. Moffatt (unpublished).
6.S. S. Gill, B. J. Sealy, and K. G. Stephens, J. Phys. D 14, 1915 (1981).
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