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Plasma parameter estimation from rf impedance measurements in a dry etching system
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10.1063/1.93948
/content/aip/journal/apl/42/5/10.1063/1.93948
http://aip.metastore.ingenta.com/content/aip/journal/apl/42/5/10.1063/1.93948
/content/aip/journal/apl/42/5/10.1063/1.93948
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/content/aip/journal/apl/42/5/10.1063/1.93948
1983-03-01
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma parameter estimation from rf impedance measurements in a dry etching system
http://aip.metastore.ingenta.com/content/aip/journal/apl/42/5/10.1063/1.93948
10.1063/1.93948
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