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Development of silver sensitized germanium selenide photoresist by reactive sputter etching in SF6
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10.1063/1.94012
/content/aip/journal/apl/42/7/10.1063/1.94012
http://aip.metastore.ingenta.com/content/aip/journal/apl/42/7/10.1063/1.94012
/content/aip/journal/apl/42/7/10.1063/1.94012
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/content/aip/journal/apl/42/7/10.1063/1.94012
1983-04-01
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Development of silver sensitized germanium selenide photoresist by reactive sputter etching in SF6
http://aip.metastore.ingenta.com/content/aip/journal/apl/42/7/10.1063/1.94012
10.1063/1.94012
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