1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Residual defects following rapid thermal annealing of shallow boron and boron fluoride implants into preamorphized silicon
Rent:
Rent this article for
USD
10.1063/1.94766
/content/aip/journal/apl/44/4/10.1063/1.94766
http://aip.metastore.ingenta.com/content/aip/journal/apl/44/4/10.1063/1.94766
/content/aip/journal/apl/44/4/10.1063/1.94766
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/44/4/10.1063/1.94766
1984-02-15
2014-09-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Residual defects following rapid thermal annealing of shallow boron and boron fluoride implants into preamorphized silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/44/4/10.1063/1.94766
10.1063/1.94766
SEARCH_EXPAND_ITEM