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CO2 laser‐induced chemical vapor deposition of titanium silicide films
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10.1063/1.96097
/content/aip/journal/apl/47/5/10.1063/1.96097
http://aip.metastore.ingenta.com/content/aip/journal/apl/47/5/10.1063/1.96097
/content/aip/journal/apl/47/5/10.1063/1.96097
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/content/aip/journal/apl/47/5/10.1063/1.96097
1985-09-01
2014-09-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: CO2 laser‐induced chemical vapor deposition of titanium silicide films
http://aip.metastore.ingenta.com/content/aip/journal/apl/47/5/10.1063/1.96097
10.1063/1.96097
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