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Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2
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10.1063/1.96000
/content/aip/journal/apl/47/8/10.1063/1.96000
http://aip.metastore.ingenta.com/content/aip/journal/apl/47/8/10.1063/1.96000
/content/aip/journal/apl/47/8/10.1063/1.96000
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/content/aip/journal/apl/47/8/10.1063/1.96000
1985-10-15
2014-11-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2
http://aip.metastore.ingenta.com/content/aip/journal/apl/47/8/10.1063/1.96000
10.1063/1.96000
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