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Relationship between secondary defects and electrical activation in ion‐implanted, rapidly annealed GaAs
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10.1063/1.96754
/content/aip/journal/apl/48/1/10.1063/1.96754
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/1/10.1063/1.96754
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/content/aip/journal/apl/48/1/10.1063/1.96754
1986-01-06
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Relationship between secondary defects and electrical activation in ion‐implanted, rapidly annealed GaAs
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/1/10.1063/1.96754
10.1063/1.96754
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