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Characterization of beam‐recrystallized Si films and their Si/SiO2 interfaces in silicon‐on‐insulator structures
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10.1063/1.96759
/content/aip/journal/apl/48/1/10.1063/1.96759
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/1/10.1063/1.96759
/content/aip/journal/apl/48/1/10.1063/1.96759
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/content/aip/journal/apl/48/1/10.1063/1.96759
1986-01-06
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characterization of beam‐recrystallized Si films and their Si/SiO2 interfaces in silicon‐on‐insulator structures
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/1/10.1063/1.96759
10.1063/1.96759
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