1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Effect of HCl on silicon point defect formation during thermal oxidation of (100) float zone silicon wafers
Rent:
Rent this article for
USD
10.1063/1.96444
/content/aip/journal/apl/48/17/10.1063/1.96444
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/17/10.1063/1.96444
/content/aip/journal/apl/48/17/10.1063/1.96444
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/48/17/10.1063/1.96444
1986-04-28
2014-08-30
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of HCl on silicon point defect formation during thermal oxidation of (100) float zone silicon wafers
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/17/10.1063/1.96444
10.1063/1.96444
SEARCH_EXPAND_ITEM