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Comparison of the damage and contamination produced by CF4 and CF4/H2 reactive ion etching: The role of hydrogen
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10.1063/1.96452
/content/aip/journal/apl/48/17/10.1063/1.96452
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/17/10.1063/1.96452
/content/aip/journal/apl/48/17/10.1063/1.96452
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/content/aip/journal/apl/48/17/10.1063/1.96452
1986-04-28
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of the damage and contamination produced by CF4 and CF4/H2 reactive ion etching: The role of hydrogen
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/17/10.1063/1.96452
10.1063/1.96452
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