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Photo‐assisted anisotropic etching of phosphorus‐doped polycrystalline silicon employing reactive species generated by a microwave discharge
1.Y. Horiike, H. Okano, and M. Shibagaki, Conference on Microcircuits, Engineering, Grenoble 1982, p. 203
2.M. Sekine, H. Okano, Y. Yamabe, N. Hayasaka, and Y. Horiike, Proceedings of 6th Symposium on Dry Process (Institute of Electrical Engineering, Tokyo, 1984), p. 74
3.L. Y. Nelson and G. C. Pimentel, J. Chem. Phys. 47, 3671 (1967);
3.M. Kawasaki, Mie University (private communication).
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