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Pulsed CO2 laser etching of polyimide
1.R. Srinivasan, J. Vac. Sci. Technol. B 1, 923 (1983).
2.J. E. Andrew, P. E. Dyer, D. Forster, and P. H. Key, Appl. Phys. Lett. 43, 717 (1983).
3.G. Gorodetsky, T. G. Kazyaka, R. L. Melcher, and R. Srinivasan, Appl. Phys. Lett. 46, 828 (1985).
4.J. H. Brannon, J. R. Lankard, A. I. Baise, F. Burns, and J. Kaufman, J. Appl. Phys. 58, 2036 (1985).
5.R. Srinivasan and B. Braren, J. Polym. Sci. 22, 2601 (1984).
6.G. Koren and J. T. C. Yeh, J. Appl. Phys. 56, 2120 (1984).
7.P. E. Dyer and J. Sidhu, J. Appl. Phys. 57, 1420 (1985).
8.G. Koren, Appl. Phys. Lett. 45, 10 (1984).
9.The careful observer will note that the R value used in Eq. (1) for computing the absorption coefficient ratio at etching intensities assumes normal incidence, whereas the value of R used to obtain the lower intensity ratio occurred at an incident angle of 22°. Since the R values for the two wavelengths are similar at 22°, it is difficult to understand how they could become significantly different from one another at 0° incidence.
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