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Enhanced ‘‘tail’’ diffusion of phosphorus and boron in silicon: Self‐interstitial phenomena
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10.1063/1.96980
/content/aip/journal/apl/48/2/10.1063/1.96980
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/2/10.1063/1.96980
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/content/aip/journal/apl/48/2/10.1063/1.96980
1986-01-13
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced ‘‘tail’’ diffusion of phosphorus and boron in silicon: Self‐interstitial phenomena
http://aip.metastore.ingenta.com/content/aip/journal/apl/48/2/10.1063/1.96980
10.1063/1.96980
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