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Patterning of fine structures in silicon dioxide layers by ion beam exposure and wet chemical etching
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10.1063/1.97070
/content/aip/journal/apl/49/11/10.1063/1.97070
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/11/10.1063/1.97070
/content/aip/journal/apl/49/11/10.1063/1.97070
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/content/aip/journal/apl/49/11/10.1063/1.97070
1986-09-15
2014-07-13
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Patterning of fine structures in silicon dioxide layers by ion beam exposure and wet chemical etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/11/10.1063/1.97070
10.1063/1.97070
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