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Improved polycrystalline silicon sheet resistance by rapid thermal annealing prior and subsequent to ion implantation
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10.1063/1.97560
/content/aip/journal/apl/49/11/10.1063/1.97560
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/11/10.1063/1.97560
/content/aip/journal/apl/49/11/10.1063/1.97560
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/content/aip/journal/apl/49/11/10.1063/1.97560
1986-09-15
2014-07-13
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improved polycrystalline silicon sheet resistance by rapid thermal annealing prior and subsequent to ion implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/11/10.1063/1.97560
10.1063/1.97560
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