Full text loading...
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Low‐loss electron images of uncoated photoresist in the scanning electron microscope
1.M. Knoll, Z. Tech. Phys. 11, 467 (1935).
2.R. F. M. Thornley and L. Cartz, J. Am. Ceram. Soc. 45, 425 (1962).
3.K. C. A. Smith and C. W. Oatley, Brit. J. Appl. Phys. 6, 391 (1955).
4.The idea of the low‐loss image was proposed by D. McMullan, Proc. IEE Pt. II, 100, 245 (1953). “…the beam from the specimen could be restricted to the electrons which have lost only small amounts of energy and which have therefore traveled only short distances through the specimen”.
5.O. C. Wells, Appl. Phys. Lett. 19, 232 (1971);
5.O. C. Wells, 16, 151 (1970); , Appl. Phys. Lett.
5.O. C. Wells, A. N. Broers, and C. G. Bremer, Appl. Phys. Lett. 23, 353 (1973); , Appl. Phys. Lett.
5.O. C. Wells, Appl. Phys. Lett. 37, 507 (1980)., Appl. Phys. Lett.
6.O. C. Wells, A. Boyde, E. Lifshin, and A. Rezanowich, Scanning Electron Microscopy (McGraw‐Hill, New York, 1974), pp. 133–150.
7.O. C. Wells (bibliography on LLE image), in Proceedings of 41st Annual Meeting Electron Microscopy Society of America, edited by G. W. Bailey (San Francisco, San Francisco, 1983), pp. 2–5.
8.P. W. Palmberg, Appl. Phys. Lett. 13, 183 (1968).
9.T. E. Everhart and R. F. M. Thornley, J. Sci. Instrum. 37, 246 (1960).
10.H. Sugiyama, Bull. Electrotech. Lab. (Japan) 15, 351 (1974).
11.S. A. Rishton, S. P. Beaumont, and C. D. W. Wilkinson, in Microcircuit Engineering 82, Grenoble, 1982, edited by H. Ahmed (printed in France, Sitecmo, Dieppe, Paris), pp. 341–346.
12.The sample was provided by M. Hatzakis. The pattern was exposed in 3‐μm‐thick photoresist by contact printing using a Hg arc source. The photoresist was AZ‐1350J and the developer was AZ developer. These are registered trademarks of the Azoplate Division of American Hoechst Corp., Somerville, NJ 08876. The material was supplied by Shipley Co., Newton, MA.
13.C. W. Oatley, J. Phys. E 14, 971 (1981).
14.M. Maussion, J. Phys. E 18, 11 (1985).
Article metrics loading...