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Enhancement of film deposition rate due to the production of Si2H6 as an intermediate in the photodecomposition of SiH4 using an ArF excimer laser
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10.1063/1.97499
/content/aip/journal/apl/49/15/10.1063/1.97499
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/15/10.1063/1.97499
/content/aip/journal/apl/49/15/10.1063/1.97499
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/content/aip/journal/apl/49/15/10.1063/1.97499
1986-10-13
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhancement of film deposition rate due to the production of Si2H6 as an intermediate in the photodecomposition of SiH4 using an ArF excimer laser
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/15/10.1063/1.97499
10.1063/1.97499
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