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Hydrogen‐free SiN films deposited by ion beam sputtering
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10.1063/1.97615
/content/aip/journal/apl/49/15/10.1063/1.97615
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/15/10.1063/1.97615
/content/aip/journal/apl/49/15/10.1063/1.97615
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/content/aip/journal/apl/49/15/10.1063/1.97615
1986-10-13
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen‐free SiN films deposited by ion beam sputtering
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/15/10.1063/1.97615
10.1063/1.97615
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