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Transient enhanced diffusion of dopants in silicon induced by implantation damage
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10.1063/1.97305
/content/aip/journal/apl/49/21/10.1063/1.97305
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/21/10.1063/1.97305
/content/aip/journal/apl/49/21/10.1063/1.97305
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/content/aip/journal/apl/49/21/10.1063/1.97305
1986-11-24
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Transient enhanced diffusion of dopants in silicon induced by implantation damage
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/21/10.1063/1.97305
10.1063/1.97305
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