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Growth of selective tungsten films on self‐aligned CoSi2 by low pressure chemical vapor deposition
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10.1063/1.97227
/content/aip/journal/apl/49/25/10.1063/1.97227
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/25/10.1063/1.97227
/content/aip/journal/apl/49/25/10.1063/1.97227
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/content/aip/journal/apl/49/25/10.1063/1.97227
1986-12-22
2014-11-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth of selective tungsten films on self‐aligned CoSi2 by low pressure chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/49/25/10.1063/1.97227
10.1063/1.97227
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