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Carbon incorporation in metalorganic chemical vapor deposition (Al,Ga)As films grown on (100), (311)A, and (311)B oriented GaAs substrates
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10.1063/1.97945
/content/aip/journal/apl/50/17/10.1063/1.97945
http://aip.metastore.ingenta.com/content/aip/journal/apl/50/17/10.1063/1.97945
/content/aip/journal/apl/50/17/10.1063/1.97945
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/content/aip/journal/apl/50/17/10.1063/1.97945
1987-04-27
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Carbon incorporation in metalorganic chemical vapor deposition (Al,Ga)As films grown on (100), (311)A, and (311)B oriented GaAs substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/50/17/10.1063/1.97945
10.1063/1.97945
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