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Stable, self‐aligned TiN x O y /TiSi2 contact formation for submicron device applications
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10.1063/1.97792
/content/aip/journal/apl/50/22/10.1063/1.97792
http://aip.metastore.ingenta.com/content/aip/journal/apl/50/22/10.1063/1.97792
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/content/aip/journal/apl/50/22/10.1063/1.97792
1987-06-01
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stable, self‐aligned TiNxOy/TiSi2 contact formation for submicron device applications
http://aip.metastore.ingenta.com/content/aip/journal/apl/50/22/10.1063/1.97792
10.1063/1.97792
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