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Gate oxide integrity and minority‐carrier lifetime correlated with Si wafer polish damage
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10.1063/1.98885
/content/aip/journal/apl/51/1/10.1063/1.98885
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/1/10.1063/1.98885
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/content/aip/journal/apl/51/1/10.1063/1.98885
1987-07-06
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Gate oxide integrity and minority‐carrier lifetime correlated with Si wafer polish damage
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/1/10.1063/1.98885
10.1063/1.98885
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