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Comment on ‘‘Diffusion model for the laser oxidation of metallic samples in air’’ [Appl. Phys. Lett. 4 9, 109 (1987)]
1.I. Ursu, L. Nanu, and I. V. Mihailescu, Appl. Phys. Lett. 49, 109 (1986).
2.See a list of related work in Ref. 1.
3.R. A. Swalin, in Atomic Diffusion in Semiconductors, edited by D. Shaw (Plenum, London, 1973), p. 65.
4.Y. Kanemitsu, H. Kuroda, and S. Shivnoya, Jpn. J. Appl. Phys. 24, 618, 940 (1984).
5.P. H. Fang (result from short wavelength excimer laser radiation on silicon, unpublished).
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