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Phosphorus doping for hydrogenated amorphous silicon films by a low‐energy ion doping technique
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10.1063/1.98464
/content/aip/journal/apl/51/4/10.1063/1.98464
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/4/10.1063/1.98464
/content/aip/journal/apl/51/4/10.1063/1.98464
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/content/aip/journal/apl/51/4/10.1063/1.98464
1987-07-27
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Phosphorus doping for hydrogenated amorphous silicon films by a low‐energy ion doping technique
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/4/10.1063/1.98464
10.1063/1.98464
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