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Electron beam recrystallization of plasma‐sprayed silicon substrates
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10.1063/1.98466
/content/aip/journal/apl/51/4/10.1063/1.98466
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/4/10.1063/1.98466
/content/aip/journal/apl/51/4/10.1063/1.98466
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/content/aip/journal/apl/51/4/10.1063/1.98466
1987-07-27
2014-09-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electron beam recrystallization of plasma‐sprayed silicon substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/4/10.1063/1.98466
10.1063/1.98466
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