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Si3N4‐Si interface formation by catalytic nitridation using nitrogen exposures on alkali metal overlayers and removal of the catalyst: N2/Na/Si (100) 2×1
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10.1063/1.98436
/content/aip/journal/apl/51/5/10.1063/1.98436
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/5/10.1063/1.98436
/content/aip/journal/apl/51/5/10.1063/1.98436
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/content/aip/journal/apl/51/5/10.1063/1.98436
1987-08-03
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Si3N4‐Si interface formation by catalytic nitridation using nitrogen exposures on alkali metal overlayers and removal of the catalyst: N2/Na/Si (100) 2×1
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/5/10.1063/1.98436
10.1063/1.98436
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