No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Void formation in thin Al films
1.C. J. Santoro, J. Electrochem. Soc. 116, 361 (1969).
2.K. Kinosita, Thin Solid Films 12, 17 (1972).
3.S. P. Murarka, I. A. Blech, and H. J. Levinstein, J. Appl. Phys. 47, 5175 (1976).
4.E. G. Colgan, J. Appl. Phys. 62, 1224 (1987).
5.E. G. Colgan, C.‐Y. Li, and J. W. Mayer, J. Mater. Res. 2, Sept./Oct. (1987).
6.E. G. Colgan, Ph.D. thesis, Cornell University, Ithaca, NY, 1987.
7.Handbook of Chemistry and Physics, 56th ed., edited by R. C. Weast (CRC, Cleveland, OH, 1975).
8.V. D. Yushin, A. N. Logvinov, L. A. Chempinskiy, and V. M. Shakbnistov, Fiz. Met. Metalloved. 41, 666 (1976).
Article metrics loading...
Full text loading...
Most read this month
Most cited this month