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Si‐SiO2 interface trap production by low‐temperature thermal processing
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10.1063/1.98383
/content/aip/journal/apl/51/7/10.1063/1.98383
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/7/10.1063/1.98383
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/content/aip/journal/apl/51/7/10.1063/1.98383
1987-08-17
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Si‐SiO2 interface trap production by low‐temperature thermal processing
http://aip.metastore.ingenta.com/content/aip/journal/apl/51/7/10.1063/1.98383
10.1063/1.98383
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