No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Novel oxidation process in Ge+‐implanted Si and its effect on oxidation kinetics
1.B. E. Deal and A. S. Grove, J. Appl. Phys. 36, 3770 (1965).
2.D. Fathy, O. W. Holland, and C. W. White (unpublished).
3.B. E. Deal, J. Electrochem. Soc. 121, 1613 (1974).
4.J. Drowart and R. E. Honig, J. Phys. Chem. 61, 980 (1957).
5.J. Drowart, G. DeMaria, and M. G. Inghram, J. Chem. Phys. 29, 1055 (1958).
6.T. Y. Tan and U. Gösele, Appl. Phys. Lett. 40, 616 (1982).
Article metrics loading...
Full text loading...
Most read this month
Most cited this month