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Silicon dioxide deposition at 100 °C using vacuum ultraviolet light
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10.1063/1.99291
/content/aip/journal/apl/52/10/10.1063/1.99291
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/10/10.1063/1.99291
/content/aip/journal/apl/52/10/10.1063/1.99291
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/content/aip/journal/apl/52/10/10.1063/1.99291
1988-03-07
2014-09-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon dioxide deposition at 100 °C using vacuum ultraviolet light
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/10/10.1063/1.99291
10.1063/1.99291
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