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CoSi2 and Si epitaxial growth in 〈111〉 Si submicron lines with application to a permeable base transistor
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10.1063/1.99266
/content/aip/journal/apl/52/11/10.1063/1.99266
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/11/10.1063/1.99266
/content/aip/journal/apl/52/11/10.1063/1.99266
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/content/aip/journal/apl/52/11/10.1063/1.99266
1988-03-14
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: CoSi2 and Si epitaxial growth in 〈111〉 Si submicron lines with application to a permeable base transistor
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/11/10.1063/1.99266
10.1063/1.99266
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