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Chemical vapor deposition of a silicon nitride layer with an excellent interface by NH3 plasma treatment
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10.1063/1.99213
/content/aip/journal/apl/52/13/10.1063/1.99213
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/13/10.1063/1.99213
/content/aip/journal/apl/52/13/10.1063/1.99213
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/content/aip/journal/apl/52/13/10.1063/1.99213
1988-03-28
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical vapor deposition of a silicon nitride layer with an excellent interface by NH3 plasma treatment
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/13/10.1063/1.99213
10.1063/1.99213
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