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Comparison of low‐pressure and plasma‐enhanced chemical vapor deposited tungsten thin films
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10.1063/1.99184
/content/aip/journal/apl/52/14/10.1063/1.99184
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/14/10.1063/1.99184
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/content/aip/journal/apl/52/14/10.1063/1.99184
1988-04-04
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of low‐pressure and plasma‐enhanced chemical vapor deposited tungsten thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/14/10.1063/1.99184
10.1063/1.99184
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