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Surface processes in CF4/O2 reactive etching of silicon
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10.1063/1.99195
/content/aip/journal/apl/52/14/10.1063/1.99195
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/14/10.1063/1.99195
/content/aip/journal/apl/52/14/10.1063/1.99195
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/content/aip/journal/apl/52/14/10.1063/1.99195
1988-04-04
2014-11-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface processes in CF4/O2 reactive etching of silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/14/10.1063/1.99195
10.1063/1.99195
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