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Ultrathin semiconductor layer masks for high vacuum focused Ga ion beam lithography
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10.1063/1.99104
/content/aip/journal/apl/52/18/10.1063/1.99104
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/18/10.1063/1.99104
/content/aip/journal/apl/52/18/10.1063/1.99104
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/content/aip/journal/apl/52/18/10.1063/1.99104
1988-05-02
2015-04-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultrathin semiconductor layer masks for high vacuum focused Ga ion beam lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/18/10.1063/1.99104
10.1063/1.99104
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