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Effect of bias on the response of metal‐oxide‐semiconductor devices to low‐energy x‐ray and cobalt‐60 irradiation
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10.1063/1.99116
/content/aip/journal/apl/52/18/10.1063/1.99116
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/18/10.1063/1.99116
/content/aip/journal/apl/52/18/10.1063/1.99116
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/content/aip/journal/apl/52/18/10.1063/1.99116
1988-05-02
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of bias on the response of metal‐oxide‐semiconductor devices to low‐energy x‐ray and cobalt‐60 irradiation
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/18/10.1063/1.99116
10.1063/1.99116
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