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Anomalous rf magnetoresistance in copper at 4 K
1.Hitachi, Ltd., alloy number C101000FE‐HIT oxygen‐free electronic copper.
2.S. De Panfilis, A. C. Melissinos, B. E. Moskowitz, J. T. Rogers, Y. K. Semertzidis, W. U. Wuensch, H. J. Halama, A. G. Prodell, W. B. Fowler, and F. A. Nezrick, Phys. Rev. Lett. 59, 839 (1987).
3.Conceptual Design of the Superconducting Super Collider, SSC Central Design Group c/o LBL, Berkeley, CA.
4.Proprietary copper electropolishing concentrate produced by Electro‐glo Corporation, Chicago, IL.
5.See, for instance, J. C. Slater, Microwave Electronics (Van Nostrand, Princeton, 1950).
6.J. D. Jackson, Classical Electrodynamics, 2nd ed. (Wiley, New York, 1975), pp. 298, 339.
7.H. Harm and H. J. Kalama, BNL Report AADD‐129, January 1967 (unpublished).
8.A. B. Pippard, Proc. R. Soc. London Ser. A 191, 385 (1947).
9.Our own measurement of an annealed wire sample obtained from this copper gave
10.J. A. Bamberger, G. T. Mulholland, A. G. Prodell, H. A. Worwetz, and C. N. Whetstone, Adv. Cryog. Eng. 13, 132 (1967).
11.Selected Cryogenic Data Notebook, Brookhaven National Laboratory Report BNL 10200‐R, Vol. I, 1980.
12.J. L. Olsen, Electron Transport in Metals (Interscience, New York, 1967), p. 74.
13.The values of and obtained from the and pair are in agreement with those from the and pair.
14.R. L. Dolecek, Phys. Rev. 119, 1501 (1960).
15.In the extreme anomalous skin effect limit one expects to be independent of B.
16.R. G. Chambers, Proc. R. Soc. London Ser. A 202, 378 (1950);
16.E. H. Sondheimer, Adv. Phys. 1, 1 (1952).
17.The observed effects for thin wires are considerably larger than those found in this investigation; see also Ref. 12.
18.R. Glosser, Phys. Rev. 156, 500 (1967) and references therein.
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