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Unusual room‐temperature intermixing and oxidation in copper deposited on a fluorinated amorphous silicon system
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10.1063/1.99516
/content/aip/journal/apl/52/3/10.1063/1.99516
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/3/10.1063/1.99516
/content/aip/journal/apl/52/3/10.1063/1.99516
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/content/aip/journal/apl/52/3/10.1063/1.99516
1988-01-18
2014-09-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Unusual room‐temperature intermixing and oxidation in copper deposited on a fluorinated amorphous silicon system
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/3/10.1063/1.99516
10.1063/1.99516
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