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Low‐temperature reactive ion etching and microwave plasma etching of silicon
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10.1063/1.99382
/content/aip/journal/apl/52/8/10.1063/1.99382
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/8/10.1063/1.99382
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/content/aip/journal/apl/52/8/10.1063/1.99382
1988-02-22
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low‐temperature reactive ion etching and microwave plasma etching of silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/52/8/10.1063/1.99382
10.1063/1.99382
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