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Epitaxy of CoSi2 on Si (111) at low temperature (≤400 °C)
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10.1063/1.100456
/content/aip/journal/apl/53/15/10.1063/1.100456
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/15/10.1063/1.100456
/content/aip/journal/apl/53/15/10.1063/1.100456
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/content/aip/journal/apl/53/15/10.1063/1.100456
1988-10-10
2014-07-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Epitaxy of CoSi2 on Si (111) at low temperature (≤400 °C)
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/15/10.1063/1.100456
10.1063/1.100456
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