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Plasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser
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10.1063/1.99919
/content/aip/journal/apl/53/17/10.1063/1.99919
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/17/10.1063/1.99919
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/content/aip/journal/apl/53/17/10.1063/1.99919
1988-10-24
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/17/10.1063/1.99919
10.1063/1.99919
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