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Characterizations of the dc discharge plasma during chemical vapor deposition for diamond growth
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10.1063/1.99790
/content/aip/journal/apl/53/19/10.1063/1.99790
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/19/10.1063/1.99790
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/content/aip/journal/apl/53/19/10.1063/1.99790
1988-11-07
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characterizations of the dc discharge plasma during chemical vapor deposition for diamond growth
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/19/10.1063/1.99790
10.1063/1.99790
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