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Low‐energy ion‐enhanced deposition of SiO2 in rf magnetron plasmas
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10.1063/1.100493
/content/aip/journal/apl/53/21/10.1063/1.100493
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/21/10.1063/1.100493
/content/aip/journal/apl/53/21/10.1063/1.100493
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/content/aip/journal/apl/53/21/10.1063/1.100493
1988-11-21
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low‐energy ion‐enhanced deposition of SiO2 in rf magnetron plasmas
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/21/10.1063/1.100493
10.1063/1.100493
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