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Angled etching of GaAs/AlGaAs by conventional Cl2 reactive ion etching
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10.1063/1.100204
/content/aip/journal/apl/53/25/10.1063/1.100204
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/25/10.1063/1.100204
/content/aip/journal/apl/53/25/10.1063/1.100204
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/content/aip/journal/apl/53/25/10.1063/1.100204
1988-12-19
2014-09-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Angled etching of GaAs/AlGaAs by conventional Cl2 reactive ion etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/25/10.1063/1.100204
10.1063/1.100204
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