1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
High‐temperature stability of Si/SiO2 interfaces and the influence of SiO flux on thermomigration of impurities in SiO2
Rent:
Rent this article for
USD
10.1063/1.100527
/content/aip/journal/apl/53/25/10.1063/1.100527
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/25/10.1063/1.100527
/content/aip/journal/apl/53/25/10.1063/1.100527
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/53/25/10.1063/1.100527
1988-12-19
2014-07-12
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High‐temperature stability of Si/SiO2 interfaces and the influence of SiO flux on thermomigration of impurities in SiO2
http://aip.metastore.ingenta.com/content/aip/journal/apl/53/25/10.1063/1.100527
10.1063/1.100527
SEARCH_EXPAND_ITEM