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New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror
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10.1063/1.101310
/content/aip/journal/apl/54/17/10.1063/1.101310
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/17/10.1063/1.101310
/content/aip/journal/apl/54/17/10.1063/1.101310
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/content/aip/journal/apl/54/17/10.1063/1.101310
1989-04-24
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/17/10.1063/1.101310
10.1063/1.101310
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