1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Production of disilane and silyl sticking coefficients during plasma‐enhanced chemical vapor deposition of hydrogenated amorphous silicon
Rent:
Rent this article for
USD
10.1063/1.101375
/content/aip/journal/apl/54/17/10.1063/1.101375
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/17/10.1063/1.101375
/content/aip/journal/apl/54/17/10.1063/1.101375
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/54/17/10.1063/1.101375
1989-04-24
2014-07-24
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Production of disilane and silyl sticking coefficients during plasma‐enhanced chemical vapor deposition of hydrogenated amorphous silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/17/10.1063/1.101375
10.1063/1.101375
SEARCH_EXPAND_ITEM