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Temperature engineered growth of low‐threshold quantum well lasers by metalorganic chemical vapor deposition
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10.1063/1.101242
/content/aip/journal/apl/54/2/10.1063/1.101242
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/2/10.1063/1.101242
/content/aip/journal/apl/54/2/10.1063/1.101242
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/content/aip/journal/apl/54/2/10.1063/1.101242
1989-01-09
2014-08-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Temperature engineered growth of low‐threshold quantum well lasers by metalorganic chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/2/10.1063/1.101242
10.1063/1.101242
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